Overview of aluminum nitride ceramics

Aluminum Nitride Ceramic is an advanced ceramic material with aluminum nitride as the main component. It has been widely used in electronics, optics, and mechanics due to its unique properties.

Features of aluminum nitride ceramics

High thermal conductivity: Aluminum nitride ceramics have relatively high thermal conductivity, usually between 170-260 W/m·K, which makes it an excellent heat dissipation material. It is especially suitable for electronic devices that require efficient heat dissipation, such as substrate materials for power semiconductor devices.

Good electrical insulation: Despite its high thermal conductivity, aluminum nitride ceramics are excellent insulators of electricity, which can effectively prevent current leakage and ensure the safe operation of electronic components.

Low dielectric constant and dielectric loss: These characteristics make aluminum nitride ceramics very suitable for use in high-frequency circuits because it can reduce energy loss during signal transmission.

High temperature resistance: Aluminum nitride ceramics can maintain structural stability and strength at extremely high temperatures. Its melting point is about 2800°C, so it is suitable for applications in high temperature environments.

Low thermal expansion coefficient: Compared with semiconductor materials such as silicon, aluminum nitride has a lower thermal expansion coefficient, which means it has better dimensional stability when the temperature changes, which helps improve packaging reliability.

Corrosion resistance: Aluminum nitride ceramics have good chemical stability to most molten metals and are not easily oxidized or corroded, allowing them to perform well in harsh environments.

High mechanical strength: Although not as hard as some other types of ceramic materials, aluminum nitride ceramics still provide enough mechanical strength to allow them to be used in many structural applications.

(Customized AlN Single Crystal Substrate Aluminium Nitride Plate Ceramic Heater Heating element for Semiconductor Chip Equipment)

Specifications of Customized AlN Single Crystal Substrate Aluminium Nitride Plate Ceramic Heater Heating element for Semiconductor Chip Equipment

The Personalized AlN Solitary Crystal Substratum Aluminium Nitride Plate Ceramic Heater is designed for high-performance semiconductor chip equipment. It acts as a dependable heating element popular commercial atmospheres. The product utilizes aluminum nitride (AlN) ceramic product recognized for superb thermal conductivity and electric insulation. This guarantees efficient heat transfer while preserving safety in semiconductor procedures.

The heater plate is developed with a single-crystal framework. This structure boosts thermal security and decreases energy loss throughout operation. It holds up against temperatures approximately 1800 ° C in inert atmospheres. The material stands up to thermal shock and chemical rust. This makes it appropriate for lasting usage in aggressive environments.

Personalization alternatives include differing thicknesses, diameters, and forms. These meet certain requirements of semiconductor manufacturing devices. The surface finish is precision-polished. This ensures monotony and level of smoothness for uniform heat distribution. Electric components are ingrained safely. This protects against detachment under high-temperature problems.

The heating system operates at high power thickness. It provides rapid home heating and cooling down cycles. This boosts procedure performance in applications like wafer annealing or CVD (Chemical Vapor Deposition). The reduced thermal growth coefficient matches common semiconductor products. This lessens stress throughout temperature level modifications.

Electric insulation homes prevent present leak. This safeguards sensitive semiconductor parts. The dielectric toughness exceeds 15 kV/mm. This ensures safety in high-voltage configurations. The item incorporates effortlessly with common semiconductor equipment. No significant modifications are required for installation.

Resilience is an essential focus. The AlN ceramic resists wear from constant thermal biking. Upkeep requirements are marginal. This decreases downtime in production lines. Compatibility with vacuum environments is confirmed. The heating unit does reliably in low-pressure conditions.

Applications consist of semiconductor construction, LED production, and power electronics. It sustains procedures calling for exact temperature control. Personalized electrical arrangements are readily available. These include electrode patterns or incurable placements. Checking data is given to confirm efficiency metrics.

The product satisfies industry requirements for purity and performance. Contamination threats are reduced because of the inert nature of aluminum nitride. Lead times for customized orders are affordable. Technical assistance is used to help with combination and troubleshooting.

This heating unit service addresses the requirement for toughness, performance, and precision in innovative semiconductor manufacturing. It combines material science with design experience to supply consistent outcomes.

(Customized AlN Single Crystal Substrate Aluminium Nitride Plate Ceramic Heater Heating element for Semiconductor Chip Equipment)

Applications of Customized AlN Single Crystal Substrate Aluminium Nitride Plate Ceramic Heater Heating element for Semiconductor Chip Equipment

Personalized AlN single crystal substrate light weight aluminum nitride plate ceramic heater burner play an essential role in semiconductor chip equipment. These components are created for high-temperature environments usual in semiconductor manufacturing. They offer stable warm circulation essential for procedures like wafer etching, thin-film deposition, and chip testing. The light weight aluminum nitride product uses extraordinary thermal conductivity. This makes certain fast warmth transfer while decreasing power loss. The single crystal framework improves toughness under repeated thermal cycles. This reduces the risk of splits or bending throughout operation.

Semiconductor production calls for accurate temperature level control. AlN ceramic heating units keep uniform home heating across huge surfaces. This is essential for consistent chip high quality. The material’s chemical inertness protects against responses with hostile gases or chemicals utilized in manufacture. This extends the heater’s lifespan even in extreme conditions. Modification permits modifications in dimension, shape, and electric properties. Producers customize these heating systems to fit particular tools designs. This adaptability sustains varied applications in lithography systems, CVD chambers, and vacuum cleaner heating systems.

AlN substratums excel in high-frequency and high-power devices. Their low electrical loss improves energy efficiency in radiofrequency applications. The ceramic’s high electric insulation stops leakage currents. This safeguards delicate semiconductor elements. Advanced bonding methods integrate these heaters with cooling systems. This combination takes care of warm dissipation in small chip-making devices.

Reliability is crucial in semiconductor production. AlN heating units run regularly at temperatures going beyond 1000 ° C. Their resistance to thermal shock avoids efficiency decreases throughout rapid heating or air conditioning. Automated production lines benefit from their quick feedback times. This lowers downtime in between process steps.

Using light weight aluminum nitride straightens with sector demands for miniaturization. Its compact form variable supports tighter assimilation in modern-day chip equipment. Designers prioritize these heating systems for procedures needing both accuracy and robustness. Their compatibility with ultra-high vacuum cleaner settings ensures suitability for advanced semiconductor modern technologies.

Functional efficiency gains from AlN heating units reduced total manufacturing expenses. Decreased maintenance demands and longer service periods contribute to sustainable production practices. These characteristics make tailored AlN substrates a functional choice for next-generation semiconductor chip equipment.

Company Introduction

Advanced Ceramics founded on October 17, 2014, is a high-tech enterprise committed to the research and development, production, processing, sales and technical services of ceramic relative materials and products.. Since its establishment in 2014, the company has been committed to providing customers with the best products and services, and has become a leader in the industry through continuous technological innovation and strict quality management.

Our products includes but not limited to Silicon carbide ceramic products, Boron Carbide Ceramic Products, Boron Nitride Ceramic Products, Silicon Carbide Ceramic Products, Silicon Nitride Ceramic Products, Zirconium Dioxide Ceramic Products, Quartz Products, etc. Please feel free to contact us.(nanotrun@yahoo.com)

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T/T, Western Union, Paypal, Credit Card etc.

Shipment Methods

By air, by sea, by express, as customers request.

5 FAQs of Customized AlN Single Crystal Substrate Aluminium Nitride Plate Ceramic Heater Heating element for Semiconductor Chip Equipment

What is AlN?
AlN stands for aluminum nitride. It is a ceramic material. It has high thermal conductivity. It works well in high-temperature settings. It resists chemical reactions. These traits make it ideal for semiconductor equipment. It handles heat efficiently. It ensures stable performance in tough conditions.

Why pick AlN over other materials?
AlN moves heat better than most ceramics. It transfers heat faster than alumina or aluminum oxide. It matches silicon wafers in how it expands with heat. This reduces stress during heating. It lasts longer under extreme temperatures. It suits precision tasks in chip manufacturing.

Can the heater’s shape or size be adjusted?
Yes. Custom sizes and shapes are possible. Heaters can fit specific equipment needs. Designs include holes or grooves for sensors. Thickness and surface patterns are adjustable. Modifications ensure compatibility with different machines.

What temperature range does it handle?
AlN heaters work from room temperature to over 1000°C. They heat evenly. Temperature stays steady even with sudden changes. This reliability is critical for delicate semiconductor processes. It prevents damage to chips during production.

How long does an AlN heater last?
AlN resists wear from heat and chemicals. Proper use extends its lifespan. Regular checks prevent dust buildup. No frequent replacements are needed. It stays reliable for years in industrial settings. Maintenance is simple.

(Customized AlN Single Crystal Substrate Aluminium Nitride Plate Ceramic Heater Heating element for Semiconductor Chip Equipment)