Overview of aluminum nitride ceramics

Aluminum Nitride Ceramic is an advanced ceramic material with aluminum nitride as the main component. It has been widely used in electronics, optics, and mechanics due to its unique properties.

Features of aluminum nitride ceramics

High thermal conductivity: Aluminum nitride ceramics have relatively high thermal conductivity, usually between 170-260 W/m·K, which makes it an excellent heat dissipation material. It is especially suitable for electronic devices that require efficient heat dissipation, such as substrate materials for power semiconductor devices.

Good electrical insulation: Despite its high thermal conductivity, aluminum nitride ceramics are excellent insulators of electricity, which can effectively prevent current leakage and ensure the safe operation of electronic components.

Low dielectric constant and dielectric loss: These characteristics make aluminum nitride ceramics very suitable for use in high-frequency circuits because it can reduce energy loss during signal transmission.

High temperature resistance: Aluminum nitride ceramics can maintain structural stability and strength at extremely high temperatures. Its melting point is about 2800°C, so it is suitable for applications in high temperature environments.

Low thermal expansion coefficient: Compared with semiconductor materials such as silicon, aluminum nitride has a lower thermal expansion coefficient, which means it has better dimensional stability when the temperature changes, which helps improve packaging reliability.

Corrosion resistance: Aluminum nitride ceramics have good chemical stability to most molten metals and are not easily oxidized or corroded, allowing them to perform well in harsh environments.

High mechanical strength: Although not as hard as some other types of ceramic materials, aluminum nitride ceramics still provide enough mechanical strength to allow them to be used in many structural applications.

(AlN Aluminum Nitride Sputtering Target Ceramic Plate Ultra High Thermal Conductivity)

Specifications of AlN Aluminum Nitride Sputtering Target Ceramic Plate Ultra High Thermal Conductivity

The AlN Aluminum Nitride Sputtering Target Ceramic Plate provides advanced efficiency for high-tech applications. This item is made from high-purity aluminum nitride powder. The product guarantees extraordinary thermal security and electrical insulation. The thermal conductivity rises to 170-200 W/m · K. This makes it optimal for managing heat in demanding environments.

The ceramic plate is developed for sputtering procedures in thin-film deposition. It works well in semiconductor manufacturing and electronic part manufacturing. The target includes a thick structure with minimal porosity. This stops contamination throughout sputtering. The thickness surpasses 3.26 g/cm FIVE. The high thickness enhances toughness and expands life span.

Dimensions are customizable to fit particular tools demands. Usual thickness choices variety from 1 mm to 10 mm. Diameters vary between 50 mm and 500 mm. Surface area roughness is managed below Ra 0.4 μm. A smooth surface area makes sure consistent movie deposition. Home plate undertakes precision brightening to meet stringent requirements.

Chemical purity is a crucial attribute. The aluminum nitride content surpasses 99.9%. Trace steel impurities are kept below 100 ppm. This guarantees minimal interference in delicate applications. The product works with vacuum cleaner settings and high-temperature operations. It maintains stability at temperature levels up to 1400 ° C.

Applications consist of LED manufacturing, power electronics, and aerospace components. The material’s high thermal conductivity effectively dissipates warmth from high-power tools. It additionally acts as a shielding substratum for integrated circuits. Resistance to thermal shock stops splitting under fast temperature changes.

Packaging complies with anti-static and moisture-proof methods. Each plate is independently wrapped to prevent damages throughout transit. Personalized qualifications like RoHS and REACH conformity are readily available upon request. The product is examined for performance uniformity across batches.

Toughness makes sure lowered substitute regularity. This reduces long-lasting operational costs. The mix of thermal and mechanical residential or commercial properties makes it a dependable selection for innovative production.

(AlN Aluminum Nitride Sputtering Target Ceramic Plate Ultra High Thermal Conductivity)

Applications of AlN Aluminum Nitride Sputtering Target Ceramic Plate Ultra High Thermal Conductivity

Light Weight Aluminum Nitride (AlN) sputtering target ceramic plates are advanced materials designed for high-performance applications. These plates feature ultra-high thermal conductivity, making them excellent for managing heat sought after settings. Their capability to transfer warm efficiently establishes them aside from standard materials. They additionally give strong electric insulation, guaranteeing security and integrity in electronic systems.

The primary use of AlN sputtering targets is in slim movie deposition procedures. These processes are important for generating semiconductors, LED screens, and advanced electronic devices. The high thermal conductivity of AlN helps prevent getting too hot in microelectronic elements. This improves gadget performance and expands their life-span.

In the electronic devices industry, AlN ceramic plates are commonly utilized for warm sinks and substrates. They take care of severe temperatures without deteriorating. This makes them ideal for power modules, laser diodes, and high-frequency circuits. Their thermal growth closely matches materials like silicon. This reduces tension and protects against damages throughout temperature level changes.

The auto market gain from AlN in electric car (EV) systems. Efficient warmth dissipation is essential for EV batteries and power converters. AlN plates make certain steady procedure under high power lots. They additionally add to small designs by replacing bulkier cooling solutions.

Aerospace and protection applications count on AlN for its resilience and thermal performance. It is utilized in radar systems, satellite communication tools, and avionics. The product withstands harsh problems, including radiation and fast temperature level changes.

AlN sputtering targets are also essential in manufacturing LED illumination systems. They enhance heat management in high-brightness LEDs, stopping efficiency loss in time. Their chemical security makes certain long-lasting performance even in destructive settings.

The production of AlN ceramic plates involves sophisticated sintering methods. This guarantees high purity and uniform framework. Custom-made sizes and shapes are available to satisfy particular commercial needs. Stringent quality control guarantees consistency in thermal and mechanical residential properties.

Light weight aluminum Nitride combines thermal conductivity with electric insulation much better than several choices. This dual functionality supports advancement in renewable resource, 5G modern technology, and advanced sensing units. Industries taking on AlN gain boosted performance, reliability, and miniaturization abilities.

Company Introduction

Advanced Ceramics founded on October 17, 2014, is a high-tech enterprise committed to the research and development, production, processing, sales and technical services of ceramic relative materials and products.. Since its establishment in 2014, the company has been committed to providing customers with the best products and services, and has become a leader in the industry through continuous technological innovation and strict quality management.

Our products includes but not limited to Silicon carbide ceramic products, Boron Carbide Ceramic Products, Boron Nitride Ceramic Products, Silicon Carbide Ceramic Products, Silicon Nitride Ceramic Products, Zirconium Dioxide Ceramic Products, Quartz Products, etc. Please feel free to contact us.(nanotrun@yahoo.com)

Payment Methods

T/T, Western Union, Paypal, Credit Card etc.

Shipment Methods

By air, by sea, by express, as customers request.

5 FAQs of AlN Aluminum Nitride Sputtering Target Ceramic Plate Ultra High Thermal Conductivity

AlN Aluminum Nitride Sputtering Target Ceramic Plate is a specialized material for thin-film deposition processes. It creates precise coatings in semiconductors and electronics. High-purity aluminum nitride ensures minimal impurities, improving film quality. This plate works in vacuum environments with techniques like magnetron sputtering.

What makes AlN sputtering targets stand out? The ultra-high thermal conductivity is key. It efficiently transfers heat, preventing damage in high-power devices. The material resists extreme temperatures and harsh chemicals. It maintains stability during intense processes. These traits make it reliable for advanced manufacturing.

Where is this product used? It’s common in semiconductor manufacturing for insulating layers. LED production relies on it for heat management. Power electronics use it to handle high thermal loads. The aerospace and automotive industries apply it for durable coatings. Research labs use it for experimental thin-film projects.

How should the plate be handled? Store it in a dry, clean area. Avoid moisture to prevent contamination. Wear gloves to keep oils from the surface. Clean the target with compatible solvents before use. Follow manufacturer guidelines for installation in sputtering systems. Proper handling extends the product’s lifespan.

Can the plate be customized? Yes. Manufacturers offer different sizes and shapes to fit equipment. Thickness and purity levels are adjustable based on needs. Custom specifications include surface finish or density. Technical support helps tailor the product for specific applications.

The AlN sputtering target suits industries needing high-performance thermal management. Its durability and efficiency meet strict industrial standards. Proper use ensures consistent results in demanding environments.

(AlN Aluminum Nitride Sputtering Target Ceramic Plate Ultra High Thermal Conductivity)